Fuji Electric Review
Vol.42-No.3 ,1996
Effects of Plasma Parameters on Properties of a-Si:H Related Films
Optical Properties of Oriented Oligothiophene Thin Films
Guard-Ring Termination for High-Voltage SiC Schottky Barrier Diodes
Properties of YBCO Films Grown by a Low Gas Pressure Sputtering Method
Double Schottky Barrier at Grain Boundary in Ceramic Semiconductors
A Simulation Technique for the Refrigerating Cycle of Canned Drink Vending Machines