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FUJI ELECTRIC REVIEW Vol.42-No.3 ,1996
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| Effects of Plasma Parameters on Properties of a-Si:H Related Films |
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(1,842KB) |
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| Optical Properties of Oriented Oligothiophene Thin Films |
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(1,912KB) |
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| Guard-Ring Termination for High-Voltage SiC Schottky Barrier Diodes |
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(1,026KB) |
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| Properties of YBCO Films Grown by a Low Gas Pressure Sputtering Method |
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(1,244KB) |
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| Double Schottky Barrier at Grain Boundary in Ceramic Semiconductors |
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(1,215KB) |
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| A Simulation Technique for the Refrigerating Cycle of Canned Drink Vending Machines |
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(2,097KB) |
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